Invention Grant
US08767324B2 Color filter substrate, display device, and exposure method 有权
滤色器基板,显示装置和曝光方法

  • Patent Title: Color filter substrate, display device, and exposure method
  • Patent Title (中): 滤色器基板,显示装置和曝光方法
  • Application No.: US13516078
    Application Date: 2010-12-10
  • Publication No.: US08767324B2
    Publication Date: 2014-07-01
  • Inventor: Kohei MatsuiRyosuke Yasui
  • Applicant: Kohei MatsuiRyosuke Yasui
  • Applicant Address: JP Tokyo
  • Assignee: Toppan Printing Co., Ltd.
  • Current Assignee: Toppan Printing Co., Ltd.
  • Current Assignee Address: JP Tokyo
  • Priority: JP2009-285213 20091216
  • International Application: PCT/JP2010/007191 WO 20101210
  • International Announcement: WO2011/074216 WO 20110623
  • Main IPC: G02B5/22
  • IPC: G02B5/22 G02F1/1335
Color filter substrate, display device, and exposure method
Abstract:
A color filter substrate is provided that allows the realization of a liquid crystal display device having excellent display quality and generating no noticeable display unevenness. On a color filter substrate, a lattice-shaped black matrix is formed, and a plurality of colored pixels are formed in matrix. The maximum value of the differences between the overlap widths Wa (or Wb) in the row direction between first colored layers and the black matrix in an area exposed through a photomask, and the overlap widths Wg (or Wh) in the row direction between second colored layers and the black matrix in an area exposed through another photomask, is 4 μm or less. Further, the maximum value of overlap widths Wa to Wl in the row direction between all of the colored pixels and the black matrix is 8 μm or less.
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