Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US13417494Application Date: 2012-03-12
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Publication No.: US08767460B2Publication Date: 2014-07-01
- Inventor: Junya Matsunami
- Applicant: Junya Matsunami
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-164479 20110727
- Main IPC: G11C8/00
- IPC: G11C8/00

Abstract:
A plurality of element isolation insulating films are formed in a semiconductor substrate in a memory cell array and have a first direction as a long direction. A plurality of element formation regions are formed isolated by the element isolation insulating films. A memory string is formed in each of the element formation regions. A plurality of element formation region groups are each configured by the element formation regions. In a memory cell array, in a second direction orthogonal to the first direction, a spacing between the element formation region groups is configured larger than a spacing between the element formation regions in each of the element formation region groups. A control circuit executes a write operation on the memory cell array on an element formation region group basis.
Public/Granted literature
- US20130028028A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2013-01-31
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