Invention Grant
- Patent Title: Gas mixture supplying method and apparatus
- Patent Title (中): 气体混合物供应方法和装置
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Application No.: US12644745Application Date: 2009-12-22
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Publication No.: US08770214B2Publication Date: 2014-07-08
- Inventor: Yohei Uchida , Takahiro Yamamoto
- Applicant: Yohei Uchida , Takahiro Yamamoto
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2008-325417 20081222
- Main IPC: C23C16/455
- IPC: C23C16/455 ; G05D7/00 ; H01L21/00 ; F17D1/02 ; B01F3/02

Abstract:
A gas mixture supplying method includes supplying plural kinds of gases through gas supply lines connected to a common pipeline and supplying a gas mixture of the plural kinds of gases from a gas outlet of the common pipeline to a region where the gas mixture is used through a gas mixture supply line. When two or more gases having different flow rates are supplied simultaneously, a gas having a relatively low flow rate is supplied from one of the gas supply lines provided at a position closer to the gas outlet than that for a gas having a relatively high flow rate.
Public/Granted literature
- US20100154908A1 GAS MIXTURE SUPPLYING METHOD AND APPARATUS Public/Granted day:2010-06-24
Information query
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