Invention Grant
US08770216B2 Device adapted to withdraw gas and to control gas flow rate discharged therefrom
有权
适于抽出气体并控制从其排出的气体流量的装置
- Patent Title: Device adapted to withdraw gas and to control gas flow rate discharged therefrom
- Patent Title (中): 适于抽出气体并控制从其排出的气体流量的装置
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Application No.: US13409279Application Date: 2012-03-01
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Publication No.: US08770216B2Publication Date: 2014-07-08
- Inventor: Cheng-Nan Yang , Lung-Yin Lin
- Applicant: Cheng-Nan Yang , Lung-Yin Lin
- Applicant Address: TW Taichung
- Assignee: Pro-Iroda Industries, Inc.
- Current Assignee: Pro-Iroda Industries, Inc.
- Current Assignee Address: TW Taichung
- Agency: Kamrath IP Lawfirm, P.A.
- Agent Alan Kamrath
- Main IPC: F24D19/08
- IPC: F24D19/08

Abstract:
A device includes a filling valve, a sleeve, an absorbing member, and a gas control unit. The filling valve can be engaged for filling liquid gas. The sleeve includes a fluid passing section that enables liquid gas outside to flow therein. The absorbing member can absorb liquid gas and is disposed in the sleeve. The gas control unit includes a main body, a gas inlet and flow rate adjusting mechanism, and a gas outlet mechanism. The gas inlet and flow rate adjusting mechanism includes an adjustably movable valve and a first air seal. The first air seal is mounted between the adjustably movable valve and the main body to prevent liquid gas from passing therebetween. The adjustably movable valve is in fluid communication with the gas outlet mechanism such that vaporized gas emitted from the absorbing member is discharged from the device from the gas outlet mechanism.
Public/Granted literature
- US20130228243A1 Device Adapted to Withdraw Gas and to Control Gas Flow Rate Discharged Therefrom Public/Granted day:2013-09-05
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