Invention Grant
- Patent Title: Pattern forming method and pattern forming apparatus in which a substrate and a mold are aligned in an in-plane direction
- Patent Title (中): 图案形成方法和图案形成装置,其中基板和模具在面内方向上对齐
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Application No.: US12842118Application Date: 2010-07-23
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Publication No.: US08770958B2Publication Date: 2014-07-08
- Inventor: Nobuhito Suehira , Junichi Seki , Masao Majima , Atsunori Terasaki , Hideki Ina
- Applicant: Nobuhito Suehira , Junichi Seki , Masao Majima , Atsunori Terasaki , Hideki Ina
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2005-168842 20050608; JP2005-302225 20051017; JP2005-302703 20051018; JP2005-137319 20060517
- Main IPC: B28B17/00
- IPC: B28B17/00

Abstract:
A pattern forming method for forming an imprinted pattern on a coating material disposed on a substrate with a pattern provided to a mold. The method includes preparing a mold provided with a first surface including a pattern area, a second surface located opposite from the first surface, and an alignment mark provided at a position at which the alignment mark is away from the first surface, contacting the pattern area of the mold with the coating material disposed on the substrate, obtaining information about positions of the mold and the substrate by using the alignment mark and a mark provided to the substrate in a state in which the coating material is disposed on the substrate at a portion where the alignment mark and the substrate are opposite to each other, and effecting alignment of the substrate with the mold in an in-plane direction of the pattern area, on the basis of the information in a state in which the pattern area and the coating material contact each other.
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