Invention Grant
- Patent Title: Polishing apparatus
- Patent Title (中): 抛光设备
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Application No.: US12668065Application Date: 2008-06-24
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Publication No.: US08771038B2Publication Date: 2014-07-08
- Inventor: Toshifumi Kimba , Hiroaki Kusa , Masaki Fujii
- Applicant: Toshifumi Kimba , Hiroaki Kusa , Masaki Fujii
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2007-182065 20070711
- International Application: PCT/JP2008/061932 WO 20080624
- International Announcement: WO2009/008293 WO 20090115
- Main IPC: B24B49/12
- IPC: B24B49/12 ; B24B9/06 ; B24B37/005

Abstract:
A polishing apparatus includes a stage configured to hold a substrate, a stage-rotating mechanism configured to rotate the stage, and a polishing head configured to polish a periphery of the substrate held by the stage. The polishing apparatus also includes a controller configured to control operations of the stage, the stage-rotating mechanism, and the polishing head, an image-capturing device configured to capture an image of the periphery of the substrate through at least one terminal imaging element arranged so as to face the periphery of the substrate, an image processor configured to process the image captured by the image-capturing device, and a liquid ejector configured to eject a light-transmissive liquid toward the periphery of the substrate to fill a space between the periphery of the substrate and the terminal imaging element with the liquid.
Public/Granted literature
- US20110034106A1 POLISHING APPARATUS Public/Granted day:2011-02-10
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