Invention Grant
- Patent Title: Electroless gold plating solution and electroless gold plating method
- Patent Title (中): 化学镀镀液和无电镀金方法
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Application No.: US13388752Application Date: 2011-04-15
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Publication No.: US08771409B2Publication Date: 2014-07-08
- Inventor: Takanobu Asakawa , Tomoyuki Fujinami
- Applicant: Takanobu Asakawa , Tomoyuki Fujinami
- Applicant Address: JP Tokyo
- Assignee: Electroplating Engineers of Japan Limited
- Current Assignee: Electroplating Engineers of Japan Limited
- Current Assignee Address: JP Tokyo
- Agency: Roberts & Roberts, LLP
- Priority: JP2010-162603 20100720
- International Application: PCT/JP2011/059350 WO 20110415
- International Announcement: WO2012/011305 WO 20120126
- Main IPC: C23C18/42
- IPC: C23C18/42 ; C23C18/44

Abstract:
It is an object of the present invention to provide an electroless gold plating solution capable of directly subjecting a plated coating film made of an underlying metal such as nickel or palladium to gold plate processing, of forming a thick gold plated coating film having a thickness of 0.1 μm or more, of forming a uniform gold plated coating film, and of safely performing plating work. The present invention relates to an electroless gold plating solution comprising: a water-soluble gold compound; and hexahydro-2,4,6-trimethyl-1,3,5-triazine or hexamethylenetetramine. Preferably, the electroless gold plating solution comprises 0.1 to 100 g/L of hexahydro-2,4,6-trimethyl-1,3,5-triazine or hexamethylenetetramine.
Public/Granted literature
- US20120129005A1 ELECTROLESS GOLD PLATING SOLUTION AND ELECTROLESS GOLD PLATING METHOD Public/Granted day:2012-05-24
Information query
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