Invention Grant
- Patent Title: Retaining ring for chemical mechanical polishing
- Patent Title (中): 化学机械抛光保持环
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Application No.: US13917250Application Date: 2013-06-13
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Publication No.: US08771460B2Publication Date: 2014-07-08
- Inventor: Steven M. Zuniga , Thomas H. Osterheld
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B5/00
- IPC: B24B5/00 ; B24B29/00
Abstract:
A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Public/Granted literature
- US20130276979A1 RETAINING RING FOR CHEMICAL MECHANICAL POLISHING Public/Granted day:2013-10-24
Information query
