Invention Grant
US08771916B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
有权
光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
- Patent Title (中): 光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
-
Application No.: US13139074Application Date: 2009-12-11
-
Publication No.: US08771916B2Publication Date: 2014-07-08
- Inventor: Shuji Hirano , Kaoru Iwato , Hiroshi Saegusa , Yusuke Iizuka
- Applicant: Shuji Hirano , Kaoru Iwato , Hiroshi Saegusa , Yusuke Iizuka
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-317751 20081212; JP2008-317752 20081212; JP2008-317754 20081212; JP2009-054291 20090306; JP2009-091616 20090403; JP2009-122470 20090520; JP2009-131275 20090529; JP2009-167004 20090715; JP2009-251478 20091030
- International Application: PCT/JP2009/071189 WO 20091211
- International Announcement: WO2010/067905 WO 20100617
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/20 ; G03F7/30
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.
Public/Granted literature
- US20110236828A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME Public/Granted day:2011-09-29
Information query
IPC分类:
