Invention Grant
- Patent Title: Radiation-sensitive composition
- Patent Title (中): 辐射敏感组合物
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Application No.: US13719264Application Date: 2012-12-19
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Publication No.: US08771923B2Publication Date: 2014-07-08
- Inventor: Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai
- Applicant: JSR Corporation
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Ditthavong & Steiner, P.C.
- Priority: JP2006-243563 20060908
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/016 ; G03F7/004

Abstract:
A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).
Public/Granted literature
- US20130108962A1 RADIATION-SENSITIVE COMPOSITION Public/Granted day:2013-05-02
Information query
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