Invention Grant
- Patent Title: Vertical gallium nitride Schottky diode
- Patent Title (中): 垂直氮化镓肖特基二极管
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Application No.: US13294903Application Date: 2011-11-11
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Publication No.: US08772144B2Publication Date: 2014-07-08
- Inventor: TingGang Zhu , Anup Bhalla , Ping Huang , Yueh-se Ho
- Applicant: TingGang Zhu , Anup Bhalla , Ping Huang , Yueh-se Ho
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee Address: US CA Sunnyvale
- Agency: Van Pelt, Yi & James LLP
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L21/44

Abstract:
A vertical conduction nitride-based Schottky diode is formed using an insulating substrate which was lifted off after the diode device is encapsulated on the front side with a wafer level molding compound. The wafer level molding compound provides structural support on the front side of the diode device to allow the insulating substrate to be lifted off so that a conductive layer can be formed on the backside of the diode device as the cathode electrode. A vertical conduction nitride-based Schottky diode is thus realized. In another embodiment, a protection circuit for a vertical GaN Schottky diode employs a silicon-based vertical PN junction diode connected in parallel to the GaN Schottky diode to divert reverse bias avalanche current.
Public/Granted literature
- US20130119393A1 Vertical Gallium Nitride Schottky Diode Public/Granted day:2013-05-16
Information query
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