Invention Grant
- Patent Title: Method of forming p-type ZnO film
- Patent Title (中): 形成p型ZnO薄膜的方法
-
Application No.: US13712127Application Date: 2012-12-12
-
Publication No.: US08772150B2Publication Date: 2014-07-08
- Inventor: Seong Ju Park , Yong Seok Choi , Jang Won Kang
- Applicant: Gwangju Institute of Science and Technology
- Applicant Address: KR Buk-Gu, Gwangju
- Assignee: Gwangju Institute of Science and Technology
- Current Assignee: Gwangju Institute of Science and Technology
- Current Assignee Address: KR Buk-Gu, Gwangju
- Agency: Nath, Goldberg & Meyer
- Agent Joshua B. Goldberg
- Priority: KR10-2012-0031636 20120328
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L21/3205

Abstract:
Disclosed herein is a method of forming a p-type zinc oxide thin film. A zinc oxide layer and an antimony oxide layer are alternately stacked one above another on a substrate, forming a superlattice layer. The superlattice layer is modified into a p-type zinc oxide thin film by annealing. Upon annealing, zinc atoms of the zinc oxide layer are diffused into the antimony oxide layer and antimony atoms of the antimony oxide layer are diffused into the zinc oxide layer.
Public/Granted literature
- US20130256654A1 Method of Forming P-Type ZnO Film Public/Granted day:2013-10-03
Information query
IPC分类: