Invention Grant
US08772214B2 Aqueous cleaning composition for removing residues and method using same
有权
用于除去残留物的水性清洁组合物及其使用方法
- Patent Title: Aqueous cleaning composition for removing residues and method using same
- Patent Title (中): 用于除去残留物的水性清洁组合物及其使用方法
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Application No.: US11250250Application Date: 2005-10-14
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Publication No.: US08772214B2Publication Date: 2014-07-08
- Inventor: Aiping Wu , Roberto John Rovito
- Applicant: Aiping Wu , Roberto John Rovito
- Applicant Address: US PA Allentown
- Assignee: Air Products and Chemicals, Inc.
- Current Assignee: Air Products and Chemicals, Inc.
- Current Assignee Address: US PA Allentown
- Agent Rosaleen P. Morris-Oskanian; Anne B. Kiernan
- Main IPC: C11D1/62
- IPC: C11D1/62 ; C11D11/00 ; C11D3/24
Abstract:
A composition and method for removing residues such as, without limitation, post etched and/or post ashed photoresist, plasma etching, ashing, and mixtures thereof from a substrate is described herein. In one aspect, there is provided a method for removing residues from a substrate comprising: contacting the substrate with a composition comprising: water; a quaternary ammonium hydroxide compound; a fluoride containing compound; and optionally a corrosion inhibitor wherein the composition is free of an added organic solvent and wherein the composition has a pH greater than 9.
Public/Granted literature
- US20070087949A1 Aqueous cleaning composition for removing residues and method using same Public/Granted day:2007-04-19
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