Invention Grant
US08772737B2 Conductive element for electrically coupling an EUVL mask to a supporting chuck
有权
用于将EUVL掩模电耦合到支撑卡盘的导电元件
- Patent Title: Conductive element for electrically coupling an EUVL mask to a supporting chuck
- Patent Title (中): 用于将EUVL掩模电耦合到支撑卡盘的导电元件
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Application No.: US13623804Application Date: 2012-09-20
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Publication No.: US08772737B2Publication Date: 2014-07-08
- Inventor: Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Nir Ben-David Dodzin , Ido Holcman , Itzak Yair , Yosi Basson
- Applicant: Applied Materials Israel, Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01L21/683 ; G03F1/14 ; G03F1/40 ; G03F1/22
Abstract:
A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.
Public/Granted literature
- US20130075605A1 CONDUCTIVE ELEMENT FOR ELECTRICALLY COUPLING AN EUVL MASK TO A SUPPORTING CHUCK Public/Granted day:2013-03-28
Information query
