Invention Grant
US08772796B2 Panel and method for fabricating the same 有权
面板及其制造方法

Panel and method for fabricating the same
Abstract:
A panel is disclosed, in which, a patterned semiconductor layer is formed on an insulation layer. The patterned semiconductor layer includes a portion corresponding to an electrode and another portion corresponding to a wiring trace. The portion corresponding to the electrode may be formed as, for example, a channel, and the other portion corresponding to the wiring trace may protect the wiring trace during fabrication process or in the structure from scratching or corrosion.
Public/Granted literature
Information query
Patent Agency Ranking
0/0