Invention Grant
- Patent Title: Reactive metal implated oxide based memory
- Patent Title (中): 反应性金属注入氧化物基记忆
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Application No.: US13616307Application Date: 2012-09-14
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Publication No.: US08772841B2Publication Date: 2014-07-08
- Inventor: D.V. Nirmal Ramaswamy , Gurtej S. Sandhu
- Applicant: D.V. Nirmal Ramaswamy , Gurtej S. Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Brooks, Cameron & Huebsch, PLLC
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/94 ; H01L21/70 ; H01L27/108

Abstract:
Methods, devices, and systems associated with oxide based memory can include a method of forming an oxide based memory cell. Forming an oxide based memory cell can include forming a first conductive element, forming an oxide over the first conductive element, implanting a reactive metal into the oxide, and forming a second conductive element over the oxide.
Public/Granted literature
- US20130015422A1 REACTIVE METAL IMPLATED OXIDE BASED MEMORY Public/Granted day:2013-01-17
Information query
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