Invention Grant
- Patent Title: Field effect trench transistor having active trenches
- Patent Title (中): 具有有源沟槽的场效应沟槽晶体管
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Application No.: US11230705Application Date: 2005-09-20
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Publication No.: US08772861B2Publication Date: 2014-07-08
- Inventor: Markus Zundel , Norbert Krischke , Thorsten Meyer
- Applicant: Markus Zundel , Norbert Krischke , Thorsten Meyer
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: DE102004045467 20040920
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
One embodiment of the invention relates to a field effect trench transistor with a multiplicity of transistor cells that are arranged like an array and whose gate electrodes are arranged in active trenches formed in a semiconductor body. Inactive trenches are arranged in the array of the transistor cells, there being no gate electrodes situated in said inactive trenches, and a series of polysilicon diodes are integrated in one or more of the inactive trenches which diodes, for protection against damage to the gate oxide through ESD pulses, are contact-connected to a source metallization at one of their ends and to a gate metallization at their other end, and/or alternatively or additionally one or more polysilicon zener diodes connected in series is or are integrated in the inactive trench or trenches and contact-connected to the gate metallization by one of its or their ends and to drain potential by its or their other end.
Public/Granted literature
- US20060071276A1 Field effect trench transistor Public/Granted day:2006-04-06
Information query
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