Invention Grant
US08772863B2 Nonvolatile semiconductor memory transistor, nonvolatile semiconductor memory, and method for manufacturing nonvolatile semiconductor memory
有权
非易失性半导体存储晶体管,非易失性半导体存储器和用于制造非易失性半导体存储器的方法
- Patent Title: Nonvolatile semiconductor memory transistor, nonvolatile semiconductor memory, and method for manufacturing nonvolatile semiconductor memory
- Patent Title (中): 非易失性半导体存储晶体管,非易失性半导体存储器和用于制造非易失性半导体存储器的方法
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Application No.: US14138910Application Date: 2013-12-23
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Publication No.: US08772863B2Publication Date: 2014-07-08
- Inventor: Fujio Masuoka , Hiroki Nakamura
- Applicant: Unisantis Electronics Singapore Pte. Ltd.
- Applicant Address: SG Peninsula Plaza
- Assignee: Unisantis Electronics Singapore Pte. Ltd.
- Current Assignee: Unisantis Electronics Singapore Pte. Ltd.
- Current Assignee Address: SG Peninsula Plaza
- Agency: Brinks Gilson & Lione
- Priority: JP2010-133057 20100610
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A nonvolatile semiconductor memory transistor included in a nonvolatile semiconductor memory includes an island-shaped semiconductor having a source region, a channel region, and a drain region formed in this order from the substrate side, a hollow pillar-shaped charge storage layer arranged so as to surround the outer periphery of the channel region in such a manner that a tunnel insulating film is interposed between the charge storage layer and the channel region, and a hollow pillar-shaped control gate arranged so as to surround the outer periphery of the charge storage layer in such a manner that an insulating film is interposed between the control gate and the charge storage layer. The insulating film is arranged so as to be interposed between the charge storage layer and the upper, lower, and inner side surfaces of the control gate.
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