Invention Grant
- Patent Title: Semiconductor photodetector that causes avalanche multiplication to occur only at photodetector portion located at central portion of mesa structure
- Patent Title (中): 导致雪崩乘法仅在位于台面结构的中心部分的光电检测器部分的半导体光电检测器
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Application No.: US12926484Application Date: 2010-11-22
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Publication No.: US08772896B2Publication Date: 2014-07-08
- Inventor: Nami Yasuoka , Haruhiko Kuwatsuka , Toru Uchida , Yoshihiro Yoneda
- Applicant: Nami Yasuoka , Haruhiko Kuwatsuka , Toru Uchida , Yoshihiro Yoneda
- Applicant Address: JP Kawasaki JP Yokohama
- Assignee: Fujitsu Limited,Sumitomo Electric Device Innovations, Inc.
- Current Assignee: Fujitsu Limited,Sumitomo Electric Device Innovations, Inc.
- Current Assignee Address: JP Kawasaki JP Yokohama
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2005-162416 20050602
- Main IPC: H01L31/107
- IPC: H01L31/107

Abstract:
In order to improve reliability by preventing an edge breakdown in a semiconductor photodetector having a mesa structure such as a mesa APD, the semiconductor photodetector includes a mesa structure formed on a first semiconductor layer of the first conduction type formed on a semiconductor substrate, the mesa structure including a light absorbing layer for absorbing light, an electric field buffer layer for dropping an electric field intensity, an avalanche multiplication layer for causing avalanche multiplication to occur, and a second semiconductor layer of the second conduction type, wherein the thickness of the avalanche multiplication layer at the portion in the vicinity of the side face of the mesa structure is made thinner than the thickness at the central portion of the mesa structure.
Public/Granted literature
- US20110068428A1 Semiconductor photodetector and method for manufacturing the same Public/Granted day:2011-03-24
Information query
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