Invention Grant
- Patent Title: Exposure apparatus
- Patent Title (中): 曝光装置
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Application No.: US13412113Application Date: 2012-03-05
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Publication No.: US08773482B2Publication Date: 2014-07-08
- Inventor: Yasuhiro Tomioka
- Applicant: Yasuhiro Tomioka
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-037106 20060214
- Main IPC: B41J2/435
- IPC: B41J2/435 ; B41J2/44

Abstract:
In an exposure apparatus employing an over filled optical system, the light quantity distribution on a scanning plane is kept nearly constant for a plurality of scanning light quantities. It selects the light quantity of the light beam irradiated onto the photosensitive body from a plurality of levels, and sets the light quantity selected. According to the light quantity, it selects one of a plurality of correction current profiles, and supplies a light source with a current passing through the correction based on the correction current profile selected. Since the light quantity of the light beam irradiated onto the photosensitive body is corrected by the correction current, the light quantity of the light beam on the photosensitive body becomes nearly constant in the scanning direction.
Public/Granted literature
- US20120212565A1 EXPOSURE APPARATUS Public/Granted day:2012-08-23
Information query
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