Invention Grant
- Patent Title: Inspection method and apparatus
- Patent Title (中): 检验方法和装置
-
Application No.: US12993463Application Date: 2009-05-25
-
Publication No.: US08773640B2Publication Date: 2014-07-08
- Inventor: Olav Johannes Seijger , Martinus Joseph Kok , Sander Kerssemakers , Mark Johannes Magielsen
- Applicant: Olav Johannes Seijger , Martinus Joseph Kok , Sander Kerssemakers , Mark Johannes Magielsen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- International Application: PCT/EP2009/056300 WO 20090525
- International Announcement: WO2009/150031 WO 20091217
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/42

Abstract:
An inspection apparatus for measuring a property of a substrate (W), includes a base frame, a substrate table (51) to hold the substrate, an illumination system arranged to direct a beam of radiation onto the substrate and a sensor arranged to detect radiation reflected off the substrate. Two balanced positioning systems displace the substrate table and sensor relative to the base frame in several directions. Each balanced positioning system includes a balance mass (59, 61), a bearing arrangement (65) to movably support the balance mass and tracks effective to guide the displacement in each direction. A motor arrangement causes the displacement in each direction. The balance mass is positioned relative to the track arrangement such that the centers of gravity of each balance mass and the substrate table or the sensor are substantially aligned in the direction substantially perpendicular to the plane including the direction of displacement.
Public/Granted literature
- US20110176123A1 Inspection Method and Apparatus Public/Granted day:2011-07-21
Information query