Invention Grant
- Patent Title: Method to determine the value of process parameters based on scatterometry data
- Patent Title (中): 基于散点数据确定过程参数值的方法
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Application No.: US10590352Application Date: 2005-02-22
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Publication No.: US08773657B2Publication Date: 2014-07-08
- Inventor: Hans Van Der Laan , Rene Hubert Jacobus Carpaij , Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers
- Applicant: Hans Van Der Laan , Rene Hubert Jacobus Carpaij , Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/NL2005/000129 WO 20050222
- International Announcement: WO2005/081069 WO 20050901
- Main IPC: G01J1/10
- IPC: G01J1/10

Abstract:
A method according to an embodiment includes obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate. Each marker structure set includes at least one calibration marker structure created using different known values of the process parameter. The method includes obtaining measurement data, with the optical detection apparatus, from at least one marker structure provided on a substrate and exposed using an unknown value of the process parameter; and determining the unknown value of the process parameter from the obtained measurement data by employing regression coefficients in a model based on the known values of the process parameter and the calibration measurement data.
Public/Granted literature
- US20070222979A1 Method to Determine the Value of Process Parameters BAsed on Scatterometry Data Public/Granted day:2007-09-27
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