Invention Grant
US08774247B2 Echelle diffraction grating, excimer laser, manufacturing method of Echelle diffraction grating, and ArF excimer laser
有权
Echelle衍射光栅,准分子激光器,Echelle衍射光栅的制造方法和ArF准分子激光器
- Patent Title: Echelle diffraction grating, excimer laser, manufacturing method of Echelle diffraction grating, and ArF excimer laser
- Patent Title (中): Echelle衍射光栅,准分子激光器,Echelle衍射光栅的制造方法和ArF准分子激光器
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Application No.: US13633343Application Date: 2012-10-02
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Publication No.: US08774247B2Publication Date: 2014-07-08
- Inventor: Takashi Sukegawa , Tsuyoshi Kitamura , Yukinobu Okura
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2011-222367 20111006; JP2012-211640 20120926
- Main IPC: H01S3/22
- IPC: H01S3/22

Abstract:
An Echelle diffraction grating has a Littrow configuration. Each grating includes a resin layer made of light curing resin and having a thickness between 2 μm and 10 μm, and a reflective coating layer formed on the resin layer, having a thickness between 120 nm and 500 nm, and made of aluminum. An apex angle between a blazed surface and a counter surface is between 85° and 90°. A first blaze angle is an angle that maximizes diffraction efficiency of a set blazed order for incident light of a wavelength of 193.3 nm. A blaze angle has an initial value of a second blaze angle smaller than the first blaze angle. 0.25°≦bd−ba≦1.2° is satisfied where bd denotes the first blaze angle and ba denotes the second blaze angle.
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