Invention Grant
- Patent Title: Device and method for forming thin film pattern
- Patent Title (中): 用于形成薄膜图案的装置和方法
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Application No.: US12912470Application Date: 2010-10-26
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Publication No.: US08776687B2Publication Date: 2014-07-15
- Inventor: Seung-Hee Nam , Tae-Hyoung Moon
- Applicant: Seung-Hee Nam , Tae-Hyoung Moon
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2009-0134812 20091230
- Main IPC: B41F1/16
- IPC: B41F1/16 ; B41L23/00

Abstract:
The present invention provides device and method for forming a thin film pattern which can maintain an extent of wetting of a printing liquid at a proper state without time dependence. The device for forming a thin film includes a printing liquid supply unit for supplying printing liquid, a cliché having a depressed pattern and a relieved pattern for patterning the printing liquid, a printing roller for having the printing liquid supplied from the printing liquid supply unit thereto coated thereon and being rolled on the cliché and the substrate, and a solvent supply unit for supplying a solvent to the printing liquid before the printing liquid coated on the printing roller is brought into contact with the cliché.
Public/Granted literature
- US20110155004A1 DEVICE AND METHOD FOR FORMING THIN FILM PATTERN Public/Granted day:2011-06-30
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