Invention Grant
- Patent Title: Film forming method, film forming device, liquid crystal arrangement method, liquid crystal arrangement device, liquid crystal device, liquid crystal device production method and electronic equipment
- Patent Title (中): 成膜方法，成膜装置，液晶布置方法，液晶布置装置，液晶装置，液晶装置的生产方法和电子设备
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Application No.: US12356738Application Date: 2009-01-21
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Publication No.: US08780317B2Publication Date: 2014-07-15
- Inventor: Kei Hiruma
- Applicant: Kei Hiruma
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2003-067006 20030312; JP2003-067007 20030312; JP2004-033600 20040210
- Main IPC: G02F1/1341
- IPC: G02F1/1341
Abstract:
A film forming device forms a coated film on a substrate by discharging a liquid material in the form of liquid droplets, and causing the liquid droplets to impact on the substrate at a predetermined pitch. The predetermined pitch is determined based on the diameter of the liquid droplets after impact of the liquid droplets on the substrate. Drop marks are reduced and a uniform coated film is formed on the substrate.
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