Invention Grant
- Patent Title: Illumination optical apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 照明光学装置,曝光装置和装置的制造方法
-
Application No.: US12703270Application Date: 2010-02-10
-
Publication No.: US08780328B2Publication Date: 2014-07-15
- Inventor: Hideki Komatsuda
- Applicant: Hideki Komatsuda
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JPP2007-208749 20070810
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G03F7/20

Abstract:
There is disclosed a illumination optical apparatus for illuminating a second surface optically conjugate with a first surface via a reflection type original plate which can be arranged on the first surface, the illumination optical apparatus comprising: a first partial field stop arranged to define a first outer edge of a illumination region which is to be formed on the second surface, in order to limit a light beam traveling toward the first surface; and a second partial field stop arranged to define a second outer edge of the illumination region, in order to limit a light beam reflecting from the reflection type original plate which can be arranged on the first surface, wherein a first distance between the first partial field stop and the first surface is set to be larger than a second distance between the second partial field stop and the first surface.
Public/Granted literature
- US20100141922A1 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-06-10
Information query