Invention Grant
- Patent Title: Plasma discharge self-cleaning filtration system
- Patent Title (中): 等离子放电自清洗过滤系统
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Application No.: US12672005Application Date: 2008-08-07
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Publication No.: US08784657B2Publication Date: 2014-07-22
- Inventor: Young I. Cho , Alexander Fridman , Alexander F. Gutsol , Yong Yang
- Applicant: Young I. Cho , Alexander Fridman , Alexander F. Gutsol , Yong Yang
- Applicant Address: US PA Philadelphia
- Assignee: Drexel University
- Current Assignee: Drexel University
- Current Assignee Address: US PA Philadelphia
- Agency: Baker & Hostetler LLP
- International Application: PCT/US2008/072502 WO 20080807
- International Announcement: WO2009/048682 WO 20090416
- Main IPC: B01D24/46
- IPC: B01D24/46 ; B01D25/32 ; B01D24/00
Abstract:
The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate strong Shockwaves that disintegrate and dislodge particulate matter located on the surface of the filter.
Public/Granted literature
- US20110266209A1 PLASMA DISCHARGE SELF-CLEANING FILTRATION SYSTEM Public/Granted day:2011-11-03
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