Invention Grant
- Patent Title: Method for manufacturing micro-structure
- Patent Title (中): 微结构制造方法
-
Application No.: US13157460Application Date: 2011-06-10
-
Publication No.: US08785114B2Publication Date: 2014-07-22
- Inventor: Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
- Applicant: Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch Stewart Kolasch & Birch, LLP
- Priority: JP2010-133606 20100611
- Main IPC: G03F7/30
- IPC: G03F7/30 ; G03F7/40 ; G03F7/038 ; G03F7/023 ; G03F7/20

Abstract:
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
Public/Granted literature
- US20110305990A1 METHOD FOR MANUFACTURING MICRO-STRUCTURE Public/Granted day:2011-12-15
Information query
IPC分类: