Invention Grant
US08791391B2 Load chamber with heater for a disk sputtering system 有权
带加热器的加载室,用于圆盘溅射系统

  • Patent Title: Load chamber with heater for a disk sputtering system
  • Patent Title (中): 带加热器的加载室,用于圆盘溅射系统
  • Application No.: US13781478
    Application Date: 2013-02-28
  • Publication No.: US08791391B2
    Publication Date: 2014-07-29
  • Inventor: Allen J. Bourez
  • Applicant: Allen J. Bourez
  • Applicant Address: US CA San Jose
  • Assignee: WD Media, LLC
  • Current Assignee: WD Media, LLC
  • Current Assignee Address: US CA San Jose
  • Main IPC: F27D5/00
  • IPC: F27D5/00
Load chamber with heater for a disk sputtering system
Abstract:
A disk processing system having a plurality of processing chambers, a load chamber comprising a heater, and a disk transport system coupled to the plurality of processing chambers and the load chamber to transport a disk there among.
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