Invention Grant
- Patent Title: High density gallium nitride devices using island topology
- Patent Title (中): 使用岛拓扑的高密度氮化镓器件
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Application No.: US13641003Application Date: 2011-04-13
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Publication No.: US08791508B2Publication Date: 2014-07-29
- Inventor: John Roberts , Ahmad Mizan , Girvan Patterson , Greg Klowak
- Applicant: John Roberts , Ahmad Mizan , Girvan Patterson , Greg Klowak
- Applicant Address: CA Ottawa
- Assignee: GaN Systems Inc.
- Current Assignee: GaN Systems Inc.
- Current Assignee Address: CA Ottawa
- International Application: PCT/CA2011/000396 WO 20110413
- International Announcement: WO2011/127568 WO 20111020
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L29/417 ; H01L29/423 ; H01L21/8252 ; H01L27/06 ; H01L29/20 ; H01L23/00 ; H01L29/40 ; H01L27/085

Abstract:
A Gallium Nitride (GaN) series of devices—transistors and diodes are disclosed—that have greatly superior current handling ability per unit area than previously described GaN devices. The improvement is due to improved layout topology. The devices also include a simpler and superior flip chip connection scheme and a means to reduce the thermal resistance. A simplified fabrication process is disclosed and the layout scheme which uses island electrodes rather than finger electrodes is shown to increase the active area density by two to five times that of conventional interdigitated structures. Ultra low on resistance transistors and very low loss diodes can be built using the island topology. Specifically, the present disclosure provides a means to enhance cost/effective performance of all lateral GaN structures.
Public/Granted literature
- US20130049010A1 HIGH DENSITY GALLIUM NITRIDE DEVICES USING ISLAND TOPOLOGY Public/Granted day:2013-02-28
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