Invention Grant
- Patent Title: Calibration of lithographic apparatus
- Patent Title (中): 光刻设备的校准
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Application No.: US13018868Application Date: 2011-02-01
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Publication No.: US08793099B2Publication Date: 2014-07-29
- Inventor: Boris Menchtchikov , Alexander Viktorovych Padiy
- Applicant: Boris Menchtchikov , Alexander Viktorovych Padiy
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01C9/00
- IPC: G01C9/00 ; G06F11/30
Abstract:
System parameters are checked through self-assessment of a production wafer without a reference or a monitor wafer. In particular, exposure errors and substrate table positioning errors can be corrected for.
Public/Granted literature
- US20110213584A1 Calibration of Lithographic Apparatus Public/Granted day:2011-09-01
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