Invention Grant
- Patent Title: Apparatus for manufacturing high purity polysilicon using electron-beam melting and method of manufacturing high purity polysilicon using the same
- Patent Title (中): 使用电子束熔化制造高纯度多晶硅的装置和使用其制造高纯度多晶硅的方法
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Application No.: US13464416Application Date: 2012-05-04
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Publication No.: US08794035B2Publication Date: 2014-08-05
- Inventor: Bo Yun Jang , Jin Seok Lee , Joon Soo Kim , Young Soo Ahn
- Applicant: Bo Yun Jang , Jin Seok Lee , Joon Soo Kim , Young Soo Ahn
- Applicant Address: KR Daejeon
- Assignee: Korea Institute of Energy Research
- Current Assignee: Korea Institute of Energy Research
- Current Assignee Address: KR Daejeon
- Agency: Patent Office of Dr. Chung Park
- Main IPC: C01B33/037
- IPC: C01B33/037 ; C30B13/22

Abstract:
Apparatus and method for manufacturing high purity polysilicon. The apparatus includes a vacuum chamber maintaining a vacuum atmosphere; first and second electron guns disposed at an upper side of the vacuum chamber to irradiate electron beams into the vacuum chamber; a silicon melting unit placed on a first electron beam-irradiating region corresponding to the first electron gun and in which powdery raw silicon is placed and melted by the first electron beam; and a unidirectional solidification unit placed on a second electron beam-irradiating region corresponding to the second electron gun and connected to the silicon melting unit via a runner. The unidirectional solidification unit is formed at a lower part thereof with a cooling channel and is provided therein with a start block driven in a downward direction.
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