Invention Grant
- Patent Title: Oblique illuminator for inspecting manufactured substrates
- Patent Title (中): 用于检查制造的基板的倾斜照明器
-
Application No.: US13257441Application Date: 2011-07-26
-
Publication No.: US08794801B2Publication Date: 2014-08-05
- Inventor: Shiyu Zhang , Charles N. Wang , Yevgeniy Churin , Yong-Mo Moon , Hyoseok Daniel Yang , Mark S. Wang
- Applicant: Shiyu Zhang , Charles N. Wang , Yevgeniy Churin , Yong-Mo Moon , Hyoseok Daniel Yang , Mark S. Wang
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- International Application: PCT/US2011/045366 WO 20110726
- International Announcement: WO2012/015819 WO 20120202
- Main IPC: F21V7/09
- IPC: F21V7/09

Abstract:
One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.
Public/Granted literature
- US20120218545A1 OBLIQUE ILLUMINATOR FOR INSPECTING MANUFACTURED SUBSTRATES Public/Granted day:2012-08-30
Information query