Invention Grant
- Patent Title: Vacuum processing apparatus and zonal airflow generating unit
- Patent Title (中): 真空处理设备和区域气流发生单元
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Application No.: US11513255Application Date: 2006-08-31
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Publication No.: US08794896B2Publication Date: 2014-08-05
- Inventor: Kengo Ashizawa
- Applicant: Kengo Ashizawa
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2005-360781 20051214
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A vacuum processing apparatus includes a vacuum processing chamber; a load lock chamber connected to the vacuum processing chamber via a gate valve or via a gate valve and a depressurized space and also connected to an atmospheric space via a door valve, an interior atmosphere of the load lock chamber being changed between a substantially atmospheric state and a depressurized state; an air blowing portion, provided at a vicinity of the door valve in the atmospheric space, for blowing a zonal airflow vertically downward from a position substantially even with or higher than a top end of a passageway of the door valve; and an air suctioning portion for suctioning the airflow or the inert gas from the air blowing portion by a vacuum force at a position substantially even with or lower than a bottom end of the passageway of the door valve.
Public/Granted literature
- US20070130738A1 Vacuum processing apparatus and zonal airflow generating unit Public/Granted day:2007-06-14
Information query
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