Invention Grant
US08795539B2 Block copolymer and method of forming patterns by using the same
有权
嵌段共聚物和通过使用它们形成图案的方法
- Patent Title: Block copolymer and method of forming patterns by using the same
- Patent Title (中): 嵌段共聚物和通过使用它们形成图案的方法
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Application No.: US13241905Application Date: 2011-09-23
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Publication No.: US08795539B2Publication Date: 2014-08-05
- Inventor: Su Mi Lee , Mio Hyuck Kang , Eun-Ae Kwak , Moon Gyu Lee , Bong-Jin Moon , Joona Bang , Hyun Jung Jung
- Applicant: Su Mi Lee , Mio Hyuck Kang , Eun-Ae Kwak , Moon Gyu Lee , Bong-Jin Moon , Joona Bang , Hyun Jung Jung
- Applicant Address: KR Yongin, Gyeonggi-Do KR Seoul
- Assignee: Samsung Display Co., Ltd.,Korea University Research and Business Foundation
- Current Assignee: Samsung Display Co., Ltd.,Korea University Research and Business Foundation
- Current Assignee Address: KR Yongin, Gyeonggi-Do KR Seoul
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2010-0095176 20100930
- Main IPC: C23F1/02
- IPC: C23F1/02
Abstract:
A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.
Public/Granted literature
- US20120080404A1 BLOCK COPOLYMER AND METHOD OF FORMING PATTERNS BY USING THE SAME Public/Granted day:2012-04-05
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