Invention Grant
- Patent Title: Nanoimprint method
- Patent Title (中): 纳米印刷法
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Application No.: US13035602Application Date: 2011-02-25
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Publication No.: US08795775B2Publication Date: 2014-08-05
- Inventor: Namil Koo , Jung Wuk Kim , Christian Moormann
- Applicant: Namil Koo , Jung Wuk Kim , Christian Moormann
- Applicant Address: DE Aachen
- Assignee: AMO GmbH
- Current Assignee: AMO GmbH
- Current Assignee Address: DE Aachen
- Agency: McCarter & English LLP
- Priority: DE102008041623 20080827
- Main IPC: B05D3/00
- IPC: B05D3/00

Abstract:
A method for applying a patterned coating of resist onto a surface of a substrate, includes embossing flowable resist at least once, wherein the flowable resist is respectively embossed between a patterned surface of a stamp and a carrier, whereby the stamp surface is provided with a patterned resist surface. The stamp carrying a first patterned part of the resist coating and the carrier carrying a second part of the resist coating are separated from each other. The patterned resist coating is transferred, wherein the first patterned part of the resist coating on the surface of the stamp is pressed against the surface of the substrate and the patterned resist coating is transferred onto the surface of the substrate. The first patterned part of the resist coating is cured and a demolding step is performed by separating the stamp from the first patterned part of the resist coating.
Public/Granted literature
- US20110171432A1 NANOIMPRINT METHOD Public/Granted day:2011-07-14
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