Invention Grant
US08795944B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
有权
光化射线敏感或辐射敏感性树脂组合物和使用该组合物的图案形成方法
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
- Patent Title (中): 光化射线敏感或辐射敏感性树脂组合物和使用该组合物的图案形成方法
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Application No.: US13139193Application Date: 2009-12-11
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Publication No.: US08795944B2Publication Date: 2014-08-05
- Inventor: Hiroshi Saegusa , Kaoru Iwato , Shuji Hirano , Yusuke Iizuka
- Applicant: Hiroshi Saegusa , Kaoru Iwato , Shuji Hirano , Yusuke Iizuka
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-317751 20081212; JP2008-317752 20081212; JP2008-317753 20081212; JP2008-317754 20081212; JP2009-054291 20090306; JP2009-091616 20090403; JP2009-122470 20090520; JP2009-131275 20090529; JP2009-167004 20090715; JP2009-251478 20091030
- International Application: PCT/JP2009/071068 WO 20091211
- International Announcement: WO2010/067898 WO 20100617
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; G03F7/039 ; G03F7/26
Abstract:
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.
Public/Granted literature
Information query
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