Invention Grant
- Patent Title: Thermal dissipation substrate
- Patent Title (中): 散热基板
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Application No.: US13548477Application Date: 2012-07-13
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Publication No.: US08796071B2Publication Date: 2014-08-05
- Inventor: YewChung Sermon Wu , Tai-Min Chang , Yu Chia Chiu , Jen-Li Hu
- Applicant: YewChung Sermon Wu , Tai-Min Chang , Yu Chia Chiu , Jen-Li Hu
- Applicant Address: TW
- Assignee: National Chiao Tung University
- Current Assignee: National Chiao Tung University
- Current Assignee Address: TW
- Agency: Volpe and Koenig, P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present invention related to a method for manufacturing a thermal dissipation substrate and a thermal dissipation substrate. The method includes steps of: (a) providing a substrate body having a surface; (b) forming a plurality of concave regions on the surface; and (c) filling the plurality of concave regions with a plurality of diamond materials. The thermal dissipation substrate includes: a substrate having a surface at a first horizontal; a plurality of regions formed on the surface at a second horizontal; and a plurality of diamond materials having a relatively high thermal coefficient and disposed on the plurality of regions.
Public/Granted literature
- US20120273803A1 THERMAL DISSIPATION SUBSTRATE Public/Granted day:2012-11-01
Information query
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