Invention Grant
US08796393B2 Production method of polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method
有权
通过制造方法得到的含有聚羟基酰亚胺的聚羟基酰亚胺和正性感光性树脂组合物的制造方法
- Patent Title: Production method of polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method
- Patent Title (中): 通过制造方法得到的含有聚羟基酰亚胺的聚羟基酰亚胺和正性感光性树脂组合物的制造方法
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Application No.: US13742860Application Date: 2013-01-16
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Publication No.: US08796393B2Publication Date: 2014-08-05
- Inventor: Kazuya Ebara
- Applicant: Nissan Chemical Industries, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2007-323639 20071214; JP2008-254178 20080930
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08J5/18 ; C08G73/10 ; G03F7/00 ; G03F7/023

Abstract:
There is provided a simple production method of polyhydroxyimide and a positive photosensitive resin composition containing the polyhydroxyimide. A production method of a polyhydroxyimide comprising: adding an acid component that is at least one type of carboxylic acid having a pKa of 0 to 5 to a polyhydroxyimide precursor of Formula (1): (where X is a tetravalent aliphatic or aromatic group, Y is an organic group containing an aromatic group substituted with at least one OH group, and n is an integer of 1 or more); and heating the resultant mixture to a temperature of 50 to 100° C. to prepare a poly imide of Formula (2): (where X, Y and n are the same as those defined above) having a weight average molecular weight of 3,000 to 100,000.
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