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US08796804B2 Forming sensing elements above a semiconductor substrate 有权
在半导体衬底上形成传感元件

Forming sensing elements above a semiconductor substrate
Abstract:
An integrated circuit structure includes a substrate and a metallization layer over the substrate. The metallization layer includes a dielectric layer and metal lines in the dielectric layer. The integrated circuit structure further includes a sensing element over the metallization layer. The sensing element may be formed in passivation layers.
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