Invention Grant
- Patent Title: Film formation system and film formation method
- Patent Title (中): 成膜系统和成膜方法
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Application No.: US12891939Application Date: 2010-09-28
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Publication No.: US08800478B2Publication Date: 2014-08-12
- Inventor: Cheng-Kuo Yeh
- Applicant: Cheng-Kuo Yeh
- Applicant Address: TW Taipei
- Assignee: Aurotek Corporation
- Current Assignee: Aurotek Corporation
- Current Assignee Address: TW Taipei
- Agency: Amin, Turocy & Watson, LLP
- Priority: TW98146226A 20091231
- Main IPC: B05C3/02
- IPC: B05C3/02 ; B05C3/09 ; B05D1/20 ; B82Y30/00 ; B82Y40/00

Abstract:
A film formation system and a film formation method are disclosed. The film formation method includes the following steps performed in the film formation system that includes a container containing liquid, a liquid draining device for draining the liquid, a ring-shaped component installed in the container, and a carrying component installed in the liquid in the container for carrying at least a substrate: enabling the carrying component in the liquid and enabling the ring-shaped component to float on the liquid; when a film layer that is composed of nano-spheres is formed on the liquid, locating the film layer in a ring of the ring-shaped component; and removing the liquid, allowing the film layer to move downward in accordance with the ring-shaped component and be formed on the substrate, thereby preventing the nano-spheres from contacting an inner wall of the container and bursting, through the installation of the ring-shaped component.
Public/Granted literature
- US20110159700A1 FILM FORMATION SYSTEM AND FILM FORMATION METHOD Public/Granted day:2011-06-30
Information query