Invention Grant
- Patent Title: Piezoelectric device, piezoelectric device manufacturing method, and liquid discharge apparatus
- Patent Title (中): 压电元件,压电元件的制造方法以及液体排出装置
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Application No.: US13000408Application Date: 2009-07-27
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Publication No.: US08801150B2Publication Date: 2014-08-12
- Inventor: Yoshikazu Hishinuma , Takehiro Kasahara , Yasukazu Nihei , Takamichi Fujii , Yuuichi Okamoto , Takami Arakawa , Takayuki Naono
- Applicant: Yoshikazu Hishinuma , Takehiro Kasahara , Yasukazu Nihei , Takamichi Fujii , Yuuichi Okamoto , Takami Arakawa , Takayuki Naono
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2008-197456 20080731
- International Application: PCT/JP2009/003529 WO 20090727
- International Announcement: WO2010/013438 WO 20100204
- Main IPC: H01L41/18
- IPC: H01L41/18 ; H01L41/083 ; H01L41/04 ; H01L41/02 ; H01L41/00 ; B41J2/045

Abstract:
A piezoelectric device, including the following on a substrate in the order listed below: a lower electrode, a piezoelectric film which contains a Pb containing perovskite oxide represented by a general expression (P) below, and an upper electrode, in which the piezoelectric film has a layer of pyrochlore oxide on the surface facing the lower electrode, and the average layer thickness of the pyrochlore oxide layer is not greater than 20 nm. AaBbO3 (P) where, A: at least one type of A-site element containing Pb as a major component, B: at least one type of B-site element selected from the group consisting of Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Sc, Co, Cu, In, Sn, Ga, Zn, Cd, Fe, and Ni, and O: an oxygen element.
Public/Granted literature
- US20110121096A1 PIEZOELECTRIC DEVICE, PIEZOELECTRIC DEVICE MANUFACTURING METHOD, AND LIQUID DISCHARGE APPARATUS Public/Granted day:2011-05-26
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