Invention Grant
- Patent Title: Composite insulating layer and manufacturing method thereof
- Patent Title (中): 复合绝缘层及其制造方法
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Application No.: US13524229Application Date: 2012-06-15
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Publication No.: US08801908B2Publication Date: 2014-08-12
- Inventor: Chuan-Li Cheng , Chao-Lun Liu , Chih-Feng Hsu
- Applicant: Chuan-Li Cheng , Chao-Lun Liu , Chih-Feng Hsu
- Applicant Address: TW Taipei
- Assignee: Chenming Mold Ind. Corp.
- Current Assignee: Chenming Mold Ind. Corp.
- Current Assignee Address: TW Taipei
- Agency: Wang Law Firm, Inc.
- Agent Li K. Wang; Stephen Hsu
- Priority: TW100149302A 20111228
- Main IPC: C23C28/00
- IPC: C23C28/00

Abstract:
A composite insulating layer and a manufacturing method thereof. The composite insulating layer includes a socket substrate, a connection layer disposed on the socket substrate, a conductive metal layer disposed on the connection layer, an insulating metal layer disposed on the conductive metal layer, an insulating ceramic layer disposed on the insulating metal layer, and a electrodeposition layer disposed on the insulating ceramic layer. The composite insulating layer of the present invention can avoid the electromagnetic interference generated from the pins of the CPU and increase the stability of the CPU.
Public/Granted literature
- US20130171464A1 Composite Insulating Layer and Manufacturing Method Thereof Public/Granted day:2013-07-04
Information query
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