Invention Grant
- Patent Title: Method for making grating
- Patent Title (中): 光栅制作方法
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Application No.: US13858191Application Date: 2013-04-08
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Publication No.: US08801946B2Publication Date: 2014-08-12
- Inventor: Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen , Shou-Shan Fan
- Applicant: Tsinghua University , Hon Hai Precision Industry Co., Ltd.
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Beijing TW New Taipei
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN201210571020 20121226
- Main IPC: B29D11/00
- IPC: B29D11/00

Abstract:
A method for making grating is provided. The method includes following steps. A substrate is provided. A mask layer is located on the substrate. The mask layer is patterned, and a number of bar-shaped protruding structures are formed on a surface of the mask layer, a slot is defined between each of two adjacent protruding structures of the number of protruding structures to expose a portion of the substrate. The protruding structures are etched so that each of two adjacent protruding structures begin to slant face to face until they are contacting each other. The exposed portion of the substrate is etched through the slot. The mask layer is removed.
Public/Granted literature
- US20140175045A1 METHOD FOR MAKING GRATING Public/Granted day:2014-06-26
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