Invention Grant
- Patent Title: Phase change random access memory and method for manufacturing the same
- Patent Title (中): 相变随机存取存储器及其制造方法
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Application No.: US14026660Application Date: 2013-09-13
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Publication No.: US08802453B2Publication Date: 2014-08-12
- Inventor: Keun Lee
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2011-0096810 20110926
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A phase change random access memory includes a semiconductor substrate having a bottom electrode formed over the semiconductor substrate; and a phase change layer formed over the bottom electrode. The phase change layer a first phase change layer formed over the bottom electrode and including at least one of a first element, a second element, and a third element; and a second phase change layer formed over a surface of the first phase change layer and formed of the first element to prevent an area of the first phase change layer from increasing through diffusion.
Public/Granted literature
- US20140011335A1 PHASE CHANGE RANDOM ACCESS MEMORY AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-01-09
Information query
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