Invention Grant
- Patent Title: Methods of making jogged layout routings double patterning compliant
- Patent Title (中): 制作慢跑布局布线的方法双重图案化
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Application No.: US13418895Application Date: 2012-03-13
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Publication No.: US08802574B2Publication Date: 2014-08-12
- Inventor: Lei Yuan , Jongwook Kye
- Applicant: Lei Yuan , Jongwook Kye
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
One illustrative method disclosed herein involves creating an overall target pattern that includes an odd-jogged feature with a crossover region that connects first and second line portions, wherein the crossover region has a first dimension in a first direction that is greater than a second dimension that is transverse to the first direction, decomposing the overall target pattern into a first sub-target pattern and a second sub-target pattern, wherein each of the sub-target patterns comprise a line portion and a first portion of the crossover region, and generating first and second sets of mask data corresponding to the first and second sub-target patterns, respectively.
Public/Granted literature
- US20130244427A1 METHODS OF MAKING JOGGED LAYOUT ROUTINGS DOUBLE PATTERNING COMPLIANT Public/Granted day:2013-09-19
Information query
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