Invention Grant
- Patent Title: Display device and manufacturing process of display device
- Patent Title (中): 显示装置的显示装置和制造工艺
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Application No.: US13596089Application Date: 2012-08-28
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Publication No.: US08803150B2Publication Date: 2014-08-12
- Inventor: Takeshi Noda , Tetsufumi Kawamura
- Applicant: Takeshi Noda , Tetsufumi Kawamura
- Applicant Address: JP Tokyo
- Assignee: Japan Display Inc.
- Current Assignee: Japan Display Inc.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2011-190006 20110831
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L31/20 ; H01L29/786 ; H01L27/12

Abstract:
Provided a display device including a thin film transistor. The thin film transistor includes a gate electrode, a gate insulating layer which covers the gate electrode, an oxide semiconductor film above the gate insulating layer, a source electrode and a drain electrode which are respectively provided in contact with a first region and a second region, which are provided in the upper surface of the oxide semiconductor film, and a channel protective film which is provided in contact with a third region between the first region and the second region. In plan view, a region of the oxide semiconductor film, which overlaps with the gate electrode, is smaller than the third region, and a portion of the oxide semiconductor film except for a portion which overlaps with the gate electrode has a resistance lower than the portion.
Public/Granted literature
- US20130048996A1 DISPLAY DEVICE AND MANUFACTURING PROCESS OF DISPLAY DEVICE Public/Granted day:2013-02-28
Information query
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