Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
-
Application No.: US13854506Application Date: 2013-04-01
-
Publication No.: US08803190B2Publication Date: 2014-08-12
- Inventor: Hiroshi Nakamura , Shigemi Miyazawa
- Applicant: Fuji Electric Co., Ltd.
- Applicant Address: JP
- Assignee: Fuji Electric Co., Ltd.
- Current Assignee: Fuji Electric Co., Ltd.
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2012-083931 20120402
- Main IPC: H01L29/74
- IPC: H01L29/74 ; H01L31/111

Abstract:
Aspects of the invention can include a semiconductor device that includes an output stage IGBT and a Zener diode on the same semiconductor substrate. The IGBT can include a first p well layer, an n emitter region on the surface region of the first p well layer, a gate electrode deposited on a gate insulating film, and an emitter electrode on the emitter region. The Zener diode can include a p+ layer formed in the surface region of a second p well layer in the place different from the first p well layer and has a higher concentration than the second p well layer, an anode electrode in ohmic contact with the surface of the p+ layer, an n− layer having a lower concentration than the second p well layer, and a cathode electrode in Schottky contact with the surface of the n− layer.
Public/Granted literature
- US20130256746A1 SEMICONDUCTOR DEVICE Public/Granted day:2013-10-03
Information query
IPC分类: