Invention Grant
- Patent Title: Lithographic apparatus and a device manufacturing method
- Patent Title (中): 光刻设备和器件制造方法
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Application No.: US13024364Application Date: 2011-02-10
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Publication No.: US08804094B2Publication Date: 2014-08-12
- Inventor: Michel Riepen , Nicolaas Rudolf Kemper
- Applicant: Michel Riepen , Nicolaas Rudolf Kemper
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A meniscus pinning device has a plurality of openings through which liquid and gas from the environment are extracted. The openings are of an intermediate size, having a maximum cross-sectional dimension (e.g., diameter) in the range of from about 75 μm to about 150 μm.
Public/Granted literature
- US20110199593A1 LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2011-08-18
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