Invention Grant
- Patent Title: Fine particle analyzing apparatus and fine particle analyzing method
- Patent Title (中): 细颗粒分析装置和细颗粒分析方法
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Application No.: US13417400Application Date: 2012-03-12
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Publication No.: US08804120B2Publication Date: 2014-08-12
- Inventor: Hironobu Tanase , Mitsuru Toishi
- Applicant: Hironobu Tanase , Mitsuru Toishi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2011-080621 20110331
- Main IPC: G01N21/49
- IPC: G01N21/49 ; G01N15/14

Abstract:
A fine particle analyzing apparatus includes a light irradiation unit configured to irradiate a fine particle that flows in a flow path with a laser beam, and a detection unit configured to detect light emitted from the fine particle that is irradiated with the laser beam. In the fine particle analyzing apparatus, the light irradiation unit includes at least a light source that is composed of a semiconductor laser, an optical fiber that converts a beam pattern of the laser beam generated from the light source into a top-hat type beam pattern, and a light source driving control unit configured to supply driving current, which is obtained by superimposing high-frequency current on direct current, to the light source.
Public/Granted literature
- US20120250018A1 FINE PARTICLE ANALYZING APPARATUS AND FINE PARTICLE ANALYZING METHOD Public/Granted day:2012-10-04
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